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Application Laboratories

INP is equip­ped with va­rious dia­gnostics me­thods for the ana­ly­sis of plas­ma pro­ces­ses and plas­ma sour­ces, of plas­ma-trea­ted sur­faces and spe­ci­fic plas­ma ap­p­li­ca­ti­ons such as bio­me­di­cal ap­p­li­ca­ti­ons and arc plas­mas in swit­ching de­vices, for cut­ting and wel­ding.

The pro­per­ties of ma­te­ri­als and the in­ter­ac­tion of ma­te­ri­als with the en­vi­ron­ment are pri­ma­ri­ly de­ter­mi­ned by sur­face con­di­ti­ons. By using plas­ma tech­no­lo­gy it is possible to spe­ci­fi­cal­ly mo­di­fy al­most any sur­face pro­per­ty and to generate new ma­te­ri­als with spe­cial func­tions that way. The ana­ly­sis of sur­faces is one of the spe­cial fiel­ds of the INP. The exis­ting spec­trum of equip­ments, the know­ledge for ope­ra­ti­on and the me­thods for analysing mea­su­re­ment da­ta are con­ti­nuous­ly ex­ten­ded and im­pro­ved. Thus, it has be­en pos­si­ble for INP to pro­du­ce high­ly pre­cise re­sults all the ti­mes and to po­si­ti­on its­elf in the world-wi­de top-le­vel re­se­arch for ye­ars. The pro­duc­tion of pre­cise re­sults and the po­si­tio­n­ing in the in­ter­na­tio­nal top-le­vel re­se­arch are gui­ding prin­ci­ples of the in­sti­tu­te.


Determination of the chemical composition and bindings in the surface

  • High-resolution X-ray photoelectron spectroscopy (XPS)
    • Lateral resolution >27 µm
    • Energy resolution: 1 eV
    • 2D imaging mode
    • Ion source (argon or coronene C24H12) for the cleaning of the surface and production of depth profiles
  • Energy dispersive X-ray spectroscopy (EDX)
    • Fast quantitative element analysis for elements starting at atomic number 5 (boron)
    • Qualitative mapping and LineScan analysis
    • Complex analysis in combination with electron microscopy
  • FT infrared spectroscopy
    • Qualitative chemical analysis of functional groups in MIR spectral range
    • Sample specific configurations: ATR, IRRAS, transmission
    • FTIR mapping of planar samples (ATR microscopy)
    • Complex analysis in combination with EDX spectroscopy

Determination of the morphology of the surface

  • Atomic force microscopy (AFM)
    • Scan range:
      • max. 100 µm x 100 µm for overview images
      • ≤ 10 µm x 10 µm for detailed images
      • ≤ 1 µm x 1 µm for high-resolution images
    • Different measurement modes:
      • C-AFM static scanning in the contact mode
      • NC-AFM oscillating scanning in non-contact mode
      • IC-AFM oscillating scanning in approximated mode
      • LFM scanning considering lateral forces (friction measurement)
      • Maximum measurable heigth difference: 6 µm
  • Scanning electron microscope (SEM)
    • Lateral resolution: 1.0 nm
    • Effective magnification: 200000 fold
    • Microscopy without artefacts using gentle-beam mode (acceleration voltage from 100 V, metallization of the sample not necessary)
    • Quantitative 3D image of the sample surface
    • Selective detection of secondary and back-scattered electrons
    • Sample preparation by cross section ion polishing
  • Profilometry
    • Height resolution: 6.5 µm, 65 µm, 131 µm, 2 mm
    • Maximum sample size: 165 mm x 165 mm x 45 mm
      Maximum lateral resolution: 4 nm
  • Optical microscope with 3D function
    • Reflected light and transmitted light microscopy
    • Resolutions: 25x, 50x, 200x, 500x
    • Stereoscopic images (3D)
      Including digital image recording, video recording

Determination of the transmission/reflection of the surface

  • UV-Vis spectral photometry
    • Wavelength range: 200 nm to 100 nm
    • Optical constants (refraction index, extinction coefficient) and geometric layer thickness of single layers
    • Estimation of the band gap of semiconducting materials

Determination of the adhesive strength of the coating

  • Taber test
    • Characterization of the scratch and abrasion resistance of planar samples
  • Calotest (calotte grinding)
    • Layer thickness measurement from 200 nm
    • Diagnostics of multilayer structures
    • Characterization of the abrasion parameters of the coatings
  • Ultrasonic bath
    • Frequency: 35 kHz
    • Power: 2 x 35 W
    • Different test liquids

Determination of the contact angle/surface energy

  • Contact angle measuring instruments
    • Minimum drop volume: 0.5 µl
    • Testing with up to 4 liquids
      • Water
      • Ethylene glycol
      • Diiodomethane
      • Optional 4th liquid
    • Including video function
spektrale_ellipsometrie_zur_bestimmung_der_eigenschaften_duenner_schichten.jpg
Spectral ellipsometry determination of the properties of thin films
elektronenmikroskopische_aufnahme_einer_nanostrukturierten_sio2-schicht.jpg
Electron micrograph of nano-structured SiO2 layer
hochaufgeloeste_elektronenmikroskopieaufnahme_von_kobalt-nanopartikeln.jpg
High-resolution electron micrograph of cobalt nanoparticles

Contact

Dr. Antje Quade
Manager Surface Diagnostics
Project leader
Phone: +49 3834 - 554 3877
quadeinp-greifswaldde

Dr. Jan Schäfer
Manager Surface Diagnostics
Project leader
Phone: +49 3834 - 554 3838
jschaeferinp-greifswaldde

The arc research la­bo­ra­to­ry ser­ves pri­ma­ri­ly for ap­p­li­ca­ti­on-driven re­se­arch for the in­crea­se of re­lia­bi­li­ty and life­time of swit­ching de­vices. The­re­fo­re, ex­pe­ri­ments on vacuum arcs and wall-stabilized arcs are uti­li­zed to stu­dy the arc be­ha­viour and the elec­tro­de load in low, medium and high vol­ta­ge switch­ge­ars at dif­fe­rent cur­rent pul­se shapes. Spe­ci­fic elec­tro­de ar­ran­ge­ments in­clu­ding ab­la­ti­on nozz­les can be used to si­mu­la­te con­di­ti­ons in re­al swit­ching de­vices or to stu­dy the in­ter­ac­tion of the electric arc with elec­tro­des, walls as well as with ma­gne­tic fiel­ds. The cou­pling between different op­ti­cal dia­gnostics for the phy­si­cal ana­ly­sis of the arc is a uni­que feature of the la­bo­ra­to­ry. For in­stan­ce, op­ti­cal emis­si­on spec­tro­sco­py al­lows for the mea­su­re­ment of tem­pe­ra­tu­res and spe­cies den­si­ties in the electric arc. High-speed ima­ging tech­ni­ques is used to stu­dy of the dy­na­mics and struc­tu­re of the arc starting from the arc igni­ti­on pro­ces­s. In ad­di­ti­on, sur­face tem­pe­ra­tu­res of the elec­tro­des can be ana­ly­sed using combined diagnostic methods.

The la­bo­ra­to­ry equipment in­clu­des in par­ti­cu­lar:

  • Set­up for the ope­ra­ti­on of high-cur­rent arcs by me­ans of pul­sed cur­rent ge­ne­ra­tors with the pa­ra­me­ters (peak va­lues): si­nuso­idal cur­rent pul­ses (DAC) up to 80 kA/ 5 ms, 40 kA/ 10 ms, or 25 kA/20 ms, squa­re wa­ve pul­ses up to 10 kA/ 2 ms or 2kA/10ms, fle­xi­ble elec­tro­de ar­ran­ge­ment in­clu­ding ac­tua­tors for elec­tro­de movement
  • Va­cu­um cham­ber in­clu­ding moun­ting sup­port for elec­tro­des, pneumatic ac­tua­tor and ac­cess for op­ti­cal dia­gnostics and pro­be mea­su­re­ments
  • Electri­cal and op­ti­cal sen­sors (pho­to­di­odes) for re­cor­ding of temporal evolutions of cur­rent, vol­ta­ge and emission si­gnals in spe­ci­fic spec­tral ran­ges as well as cor­re­spon­ding me­thods for their ana­ly­sis 
  • 0.5 and 0.75 m spec­tro­graphs with in­ten­si­fied CCD ca­me­ras (sin­gle images with ex­po­sure ti­mes from few ns to ms) for op­ti­cal emis­si­on spec­tro­sco­py, in par­ti­cu­lar for mea­su­re­ments with high spa­ti­al and spec­tral re­so­lu­ti­on in the in spec­tral ran­ge from 300 nm to 900 nm with re­so­lu­ti­on of up to 0.05 nm
  • High speed ima­ging ca­me­ras for up to 70000 frames/s for the stu­dy of the arc dy­na­mics in­clu­ding spec­tral selec­tive fil­ters (nar­row band MIF, edge fil­ters, po­la­ri­zer fil­ters), double frame optics for si­mul­ta­neous re­cor­ding with two dif­fe­rent fil­ters and one ca­me­ra
  • Framing ca­me­ra (4 in­de­pen­dent images wi­t­hin e.g. 5 ns with ex­po­sure ti­me of 3 ns) and Streak ca­me­ra (tem­po­ral re­so­lu­ti­on <1 ns, 1 spa­ti­al di­men­si­on) for the ob­ser­va­ti­on of arc igni­ti­on pro­ces­ses in the ns-ran­ge 
  • Ther­mo­gra­phy / py­ro­me­try for con­tact­less mea­su­re­ment of sur­face tem­pe­ra­tu­res of e.g. elec­tro­des

Most of the mea­su­re­ment equipment (spec­tro­sco­py, high-speed ima­ging, ther­mo­gra­phy) are mo­bi­le and can be used for ex­ter­nal mea­su­re­ment cam­pai­gns.

Contact

Dr. Sergey Gortschakow
Management Plasma Radiation Techniques
Phone: +49(0) 3834 554 3820
sergey.gortschakowinp-greifswaldde

Main to­pics of the ap­p­li­ca­ti­on-driven re­se­arch in the la­bo­ra­to­ry con­cern pro­cess safe­ty, sta­bi­li­ty and ef­fi­ci­en­cy of arc wel­ding technology. The fo­cus is put on the tem­po­ral­ly and spa­ti­al­ly re­sol­ved ana­ly­sis of the wel­ding arcs, the arc at­tach­ment at the elec­tro­des, the ma­te­ri­al trans­fer and the weld pool pro­per­ties. The plas­ma dia­gnostics al­lows for the mea­su­re­ments of tem­pe­ra­tu­re and spe­cies den­si­ties as well as, fi­nal­ly, the de­ter­mi­na­ti­on of the plas­ma pro­per­ties of the wel­ding arc. High-speed ima­ging tech­ni­ques is used to stu­dy the arc structure, its dy­na­mics and the ma­te­ri­al trans­fer. In ad­di­ti­on, sur­face tem­pe­ra­tu­res of the weld pool and of the metal drop­lets can be ana­ly­sed.

The la­bo­ra­to­ry al­lows for the stu­dy of wel­ding arc pro­ces­ses un­der realistic con­di­ti­ons in practical applications and is equip­ped with mo­dern mea­su­ring tech­ni­ques, in par­ti­cu­lar

  • Set­ups with fi­xed moun­ting of the welding and fle­xi­ble mo­ve­ment of test sub­stra­tes un­der the bur­ner for the op­ti­cal stu­dy of the pro­cess from dif­fe­rent sights of view, e.g. from top, par­al­lel or per­pen­di­cu­lar to the sub­stra­te sur­face in­clu­ding gas feed, ex­haust unit and ra­dia­ti­on pro­tec­tion
  • Cur­rent sour­ces of dif­fe­rent ma­nu­fac­tu­rers (e.g. Fro­ni­us CMT ad­van­ced 4000R, EWM Pho­enix 521 pro­gress pul­se cold­arc) as well as a fre­e­ly pro­gramma­ble sour­ce (Top­Con Qua­dro)
  • Electri­cal  and op­ti­cal sen­sors (pho­to­di­odes) for re­cor­ding of ti­me sequences of cur­rent, vol­ta­ge and emission si­gnals in spe­ci­fic spec­tral ran­ges as well as cor­re­spon­ding me­thods for their ana­ly­sis
  • 0.5 and 0.75 m spec­tro­graphs with in­ten­si­fied CCD ca­me­ras (sin­gle images with ex­po­sure ti­mes from few ns to ms) for op­ti­cal emis­si­on spec­tro­sco­py, in par­ti­cu­lar for mea­su­re­ments with high spa­ti­al and spec­tral re­so­lu­ti­on in the in spec­tral ran­ge from 300 nm to 900 nm with re­so­lu­ti­on of up to 0.05 nm
  • High speed ima­ging ca­me­ras for up to 70000 frames/s for pro­cess con­trol in­clu­ding spec­tral selec­tive fil­ters (nar­row band MIF, edge fil­ters, po­la­ri­zer fil­ters) with double frame optics  for si­mul­ta­neous re­cor­ding with two dif­fe­rent fil­ters and one ca­me­ra
  • Framing ca­me­ra (4 in­de­pen­dent images wi­t­hin e.g. 5 ns with ex­po­sure ti­me of 3 ns) and Streak ca­me­ra (tem­po­ral re­so­lu­ti­on <1 ns, 1 spa­ti­al di­men­si­on) for the ob­ser­va­ti­on of arc igni­ti­on pro­ces­ses in the ns-ran­ge
  • Ther­mo­gra­phy / py­ro­me­try for con­tact­less mea­su­re­ment of sur­face tem­pe­ra­tu­res of e.g. elec­tro­des
  • X-ray com­pu­ter to­mo­gra­phy for non-de­struc­tive dia­gnostics of elec­tro­des and ma­te­ri­al pro­bes

Most of the mea­su­re­ment set­ups (spec­tro­sco­py, high speed ima­ging, ther­mo­gra­phy) are mo­bi­le and can be used for ex­ter­nal mea­su­re­ment cam­pai­gns. 

Contact

Dr. Sergey Gortschakow
Management Plasma Radiation Techniques
Phone: +49(0) 3834 554 3820
sergey.gortschakowinp-greifswaldde

The fo­cus of the ap­p­li­ca­ti­on-driven re­se­arch in the la­bo­ra­to­ry is put on the in­crea­se of re­lia­bi­li­ty and life­time of electri­cal com­po­n­ents ta­king in par­ti­cu­lar into ac­count the as­pects of en­vi­ron­men­tal pro­tec­tion and en­er­gy ef­fi­ci­en­cy. The fol­lo­wing to­pics are cur­rent­ly under investigation on in the la­bo­ra­to­ries for high cur­rent and high vol­ta­ge en­gi­nee­ring (at the joint pro­fes­sor­ship at the Uni­ver­si­ty of Ros­tock):

  • electric con­tacts and con­junc­tions (long-term sta­bi­li­ty, aging, ther­mal di­men­sio­ning, de­sign)
  • par­ti­al di­sch­ar­ge dia­gnostics and ana­ly­sis of electri­cal com­po­n­ents
  • aging of iso­la­ti­on ma­te­ri­als un­der ex­tre­me con­di­ti­ons
  • electric arc plas­mas: ex­pe­ri­ments, mo­del­ling and dia­gnostics of swit­ching arcs (see al­so Arc Research La­bo­ra­to­ry of INP)

Available equipment:

  • High vol­ta­ge la­bo­ra­to­ry with di­gi­tal mea­su­ring sys­tem in­clu­ding par­ti­al di­sch­ar­ge mea­su­re­ment (ba­sic noi­se le­vel <1 pC), for AC vol­ta­ge up to 100 kV, DC vol­ta­ge up to 130 kV, im­pul­se vol­ta­ge 135 kV
  • Par­ti­al di­sch­ar­ge dia­gnostics (IEC 60270, UHF), impedance mea­su­re­ment sys­tem (35 TΩ, pro­be vol­ta­ge 10 kV), dielectric re­s­pon­se ana­ly­zer (200V, 100 μHz ..5 kHz)
  • Cli­ma­te la­bo­ra­to­ry with cli­ma­te cham­bers for coo­ling and warm up cy­cles (-70 - +180 °C), ther­mo-cham­bers (+250 °C)
  • High cur­rent la­bo­ra­to­ry with con­ti­nuous-cur­rent set­ups (max. 3000 A), tem­pe­ra­tu­re mea­su­re­ment with ther­mo-sen­sors as well as IR ca­me­ra tech­no­lo­gy 

Contact

Prof. Dr. Dirk Uhrlandt
Division Manager of Materials and Energy
Phone: +49 3834 - 554 461
uhrlandtinp-greifswaldde

The application-oriented research activities in the department of plasma diagnostics are centered on investigations for process monitoring and control, especially in molecular plasma processes. The focus is on the time and space-resolved qualitative and quantitative chemical analysis of molecular plasmas, both in the gas phase and on surfaces.

Plasma diagnostics enables the absolute measurement of energy and temperature distributions as well as densities of stable and transient species in the plasma by means of probe diagnostics, absorption spectroscopy, and optical emission spectroscopy allowing the determination of all relevant chemical processes.

For the investigations, specially equipped laboratories are available for diagnostics on chemical plasma processes simulated in a practical manner with state-of-the-art measuring equipment, in particular laser-based plasma diagnostics. Spectroscopic questions in the spectral range from ultraviolet to terahertz are addressed.

In 2019, the new application laboratory for plasma diagnostics with a focus on atmospheric pressure plasma sources was founded. In this laboratory, various diagnostics of the institute are concentrated in one place in order to provide a central contact point for the characterization of atmospheric pressure plasmas. In the future, important parameters such as electron density or atomic and molecular spezies densities will be quantified in different types of plasma sources.

The following methods are used in the laboratories of the department of plasma diagnostics for the quantitative determination of important parameters such as the species densities and their temperatures, the energy distribution of charged particles and for the characterization of all relevant chemical reaction paths:

  1. Absorption spectroscopy in the UV-Vis-Mid-IR-THz spectral range
  2. Cavity-enhanced spectroscopy
  3. Laser-induced fluorescence (UV-VIS)
  4. Optical emission spectroscopy (UV-VIS)
  5. Probe diagnostic
  6. Microwave interferometry 50 and 150 GHz
  7. Mass spectrometry
  8. Synchronised electrical and optical sub-ns diagnostics

The diagnostic methods are also suitable to be transported for external measurements.

Contact

Dr. Jean-Pierre van Helden
Programme Manager Plasma Diagnostics
Phone: +49 3834 554 3811
jean-pierre.vanheldeninp-greifswaldde

The INP has its own microbiological laboratory of the security level 2 according to § 44 IfSG (German Infectious Diseases Protection Act) allowing activities with pathogens in accordance with § 49 IfSG and § 13 BioStoffV (2000/54/EG and 2010/32/EU). Current research activities include phytopathogens and human pathogens of risk groups 1 and 2. The microorganisms used are:

  • Bacillus atrophaeus endospores
  • Candida albicans
  • Enterococcus faecium
  • Escherichia coli
  • Geobacillus stearothermophilus endospores
  • Listeria innocua
  • Listeria monocytogenes
  • Micrococcus luteus
  • Pectobacterium carotovorum
  • Pseudomonas fluorescens
  • Pseudomonas marginalis
  • Salmonella enteritidis
  • Salmonella typhimurium
  • Staphylococcus aureus

In addition, the institute has cooperations with accredited and certified testing laboratories in the field of hygiene and participates in interlaboratory tests within research projects.

Contact

Dr. Veronika Hahn
Phone: +49(0) 3834 554 3872
veronika.hahninp-greifswaldde

De­ve­lop­ment of plas­ma pro­ces­ses for dis­in­fec­tion and ste­ri­liza­t­i­on of me­di­cal pro­ducts and hy­gie­niza­t­i­on of food pro­ducts. The fo­cus of the de­ve­lop­ment is cur­rent­ly on the fol­lo­wing sys­tems:

  • Gas plas­ma pro­ces­ses for the repro­ces­sing of me­di­cal de­vices
  • Gas plas­ma pro­ces­ses for the gent­le pre­ser­va­ti­on of food pro­ducts
  • Spe­cial plas­ma sour­ces to be build in­to en­do­scopes for the sup­port of the pre­pa­ra­ti­on and for the­ra­peu­tic ap­p­li­ca­ti­ons
  • Plas­ma pro­ces­ses for the an­ti­mi­cro­bi­al coa­ting

In ad­di­ti­on to dif­fe­rent plas­ma dia­gnostics me­thods (OES, LIF, MW in­ter­fe­ro­me­try), in-hou­se mi­cro­bio­lo­gi­cal la­bo­ra­to­ries are avail­able for the ana­ly­sis and op­ti­miza­t­i­on of the sys­tems and can be ma­de avail­able to ex­ter­nal users.

Contact

Prof. Jürgen Kolb
Programme Manager Decontamination
Phone: +49 3834 - 554 3950
juergen.kolbinp-greifswaldde

Pro­vi­si­on, op­ti­miza­t­i­on and de­ve­lop­ment of me­thods and sys­tems of high-fre­quen­cy en­gi­nee­ring. They are used from the small-si­gnal ran­ge for dia­gnostic ap­p­li­ca­ti­ons to the lar­ge-si­gnal ran­ge for the ope­ra­ti­on of mi­cro­wa­ve plas­ma sour­ces.
The fo­cus is cur­rent­ly on the fol­lo­wing sys­tems:

  • (fre­quen­cy-re­sol­ved) mi­cro­wa­ve in­ter­fe­ro­me­try power con­trol­led and in free ra­dia­ting sys­tems up to 150 GHz
    • Elec­tron den­si­ty de­ter­mi­na­ti­on: 1012 – 1022 m-3,
      ∆t < 1 µs
    • De­ter­mi­na­ti­on of per­mit­ti­vi­ty und per­me­a­bi­li­ty
  • De­ve­lop­ment and im­ple­men­ta­ti­on of beam-shaping ele­ments (mir­rors and len­ses) for the ad­just­ment of Gaus­si­an beam paths up to 150 GHz
  • fre­quen­cy-re­sol­ved re­flec­to­metry in power con­trol­led and in free ra­dia­ting sys­tems up to 50 GHz
    • Sin­gle-port in­ter­fe­ro­me­try for the elec­tron den­si­ty de­ter­mi­na­ti­on
  • Ad­just­ment and op­ti­miza­t­i­on of me­thods of the di­gi­tal si­gnal pro­ces­sing
  • De­ve­lop­ment of mi­cro­wa­ve com­po­n­ents for the ma­ni­pu­la­ti­on of scat­te­ring pa­ra­me­ters
    • Pha­se shif­ter
    • Matching net­works
    • Mo­de cou­pler
    • Bar­ri­er-free re­ac­tor ac­cess ports
  • De­ve­lop­ment of mi­cro­wa­ve plas­ma sour­ces
    • Mi­ni-MIP (powers < 100 W)
    • Plexc (powers < 1500 W)

The de­ve­lop­ment ac­tivi­ties in the lis­ted fiel­ds of ac­tivi­ty are sup­por­ted by nu­me­ri­cal tools such as Mat­lab©, Com­sol Mul­ti­phy­sics© und CST Mi­cro­wa­ve Stu­dio©. The re­sults ob­tai­ned with it can be va­li­da­ted by me­ans of sys­tems for net­work ana­ly­sis with a mea­su­ring ran­ge up to 50 GHz.

Contact

Dr. Jörg Ehlbeck
Management Plasma Bioengineering
Phone: +49 3834 - 554 458
ehlbeckinp-greifswaldde

The “Materials Characterisation Lab” provides a large range of analytical facilities for investigation of crystallographic properties such as crystal phase identity, bond lengths and angles as well as site occupancies of lattice sites. Band structure, defect formation in grain and grain boundaries as well as associated transport properties are studied by a means of a portfolio of electrochemical ac and dc methods. A recent addition are experimental setups to determine gas permeation rates (hydrogen and oxygen) in materials.

Bruker D8 Advance x-ray diffractometer:  Cu Kα X-ray source, X-ray patterns in Bragg-Brentano or grazing incidence for 2θ angles between 5° and 140° with a resolution of 0.02°can be obtained by means of a LYNXEYE point and linear detector. X-ray diffraction (XRD) on polycrystalline layers and powders for identification of crystal phases and crystal size determination. Analysis is performed by Diffrac Eva software and Rietveld refinement by TOPAS software using multiple licensed databases.

Malvern Instruments MasterSizer 2000: Determination of particle size distributions for powders ranging from 20 nm to 2 mm particle size. Additional options are calculation of the specific surface and averaged particle size. Particle size distribution can be displayed as a function of particle volume, surface area or statistic particle number. Powders can be dispersed either in dry or in wet environment.

Renishaw inVia Raman microscope: Raman spectroscopy by means of a RL532C100 Laser source (wavelength = 532 nm, Pmax>1W) for the characterization of materials using molecular vibrations or phonon vibrations in solids. Wavenumbers ranging from 100 cm-1 to 3600 cm-1 can be analyzed using the WiRE Windows-based Raman Environment) software.

Digital microscope Keyence: 2D and 3D photos of up to 1000x magnification

FTIR-Spectrometer: Bruker VERTEX 70v: digital FTIR vacuum spectrometer for measurements in the MIR range (8000 to 350 cm-1) and FIR range (600 to 50 cm-1) with grazing reflection unit, ATR unit for both spectral ranges, and variable reflection unit

Buehler cross-section preparation kits: Mechanical polishing device Buehler EcoMet250 und precision saw IsoMet 4000 are employed to realize cross-sections of to a 50nm finish.

Zahner TLS03 and Autolab PGSTAT 302N including impedance Jig For AC impedance spectroscopy for frequencies ranging from 0.1 Hz to 10 MHz with possible use of a DC bias for the separation of bulk and grain boundary conductivities in different atmospheres and temperature regimes. Moreover, cyclic voltammetry can be used to study materials in solution.

Hydrogen perimeability test jig: Measurements of the permeability of hydrogen in materials by means of mass spectroscopy.

Furthermore, A setup for ammonia synthesis by electrolysis and an oxygen permeability jig are under construction.

Contact

Dr. Marcel Wetegrove
Phone: +49(0) 3834 554 3944
marcel.wetegroveinp-greifswaldde

Jan Wallis
Phone: +49(0) 3834 554 3822
jan.wallisinp-greifswaldde

The “PiL Materials Lab” is a new application lab at the INP with a range of batch- and flow-through reactors as well as a portfolio of pulsed high voltage generators for rapid synthesis of nanoparticle suspensions from liquid or solid precursors at atmospheric pressure. A unique combination of expertises in chemistry, physics and engineering allows for precise tailoring of modular synthesis routes for hybrids and complex nanomaterials, such as electrode and membrane materials and catalysts.

Following plasma sources and reactors are available for nanoparticle synthesis:

Kurita pekuris (CAMI II):

  • Model MPP-HV04
  • Bipolar pulse modulator in the liquid using SiC power device
  • Voltage < 10 kV
  • Frequency 2 – 200 kHZ
  • Pulse with 150 ns – 1.5 µs at 200 kHz
  • Power 1.5 kVA

Kurita pekuris (CAMI III):

  • Model MPP04-B4-300-D230
  • Bipolar pulse modulator in the liquid using SiC power device
  • Voltage < 10 kV
  • Frequency 3 – 300 kHZ
  • Pulse with 150 ns – 1.1 µs at 300 kHz
  • Power 1.5 kVA

Plasma in Liquid Reactor 1 (PiL R1)

  • Quartz reactor (total volume 20 ml)
  • Rod-to-plate configuration (W electrode and Mo plate)
  • Ar flow through the electrode holder
  • Cooling plate system connected to a thermostatic bath

Plasma in Liquid Reactor 2 (PiL R2)

  • Teflon reactor with inner quartz glass
  • Total volume 150 ml
  • Rod-to-rod configuration with Ar flow through the electrode holders
  • Cooling plate system connected to a thermostatic bath

Plasma in Liquid Reactor 3 (PiL R3)

  • Teflon reactor for vanadium synthesis
  • Total volume 250 ml
  • Rod-to-rod configuration with Ar flow through the electrode holders
  • Inner electrode holder diameter 2 Ø
  • Flow external cooling system connected to a thermostatic bath

Plasma in Liquid Reactor 4 (PiL R4)

  • Teflon reactor for Graphene synthesis
  • Total volume 250 ml
  • Rod-to-rod configuration with Ar flow through the bottom
  • Inner electrode holder diameter: sizes 2 and 4 Ø
  • Flow external cooling system connected to a thermostatic bath

Contact

 Camila Andrea Rojas Nunez
Phone: +49(0) 3834 554 3947
camila.rojas-nunezinp-greifswaldde

Tilo Schulz
Phone: +49(0) 3834 554 3963
tilo.schulzinp-greifswaldde

The application lab “PVD Processing and Coatings” bundles the INP’s long term leading expertise in thin film and nanomaterials synthesis by vacuum-based plasma methods. Reactors are available for multi-target co-deposition and high power impulse magnetron sputtering as well as plasma ion-assisted electron beam evaporation, complemented by surface activation and chemical vapor deposition. In combination with in house engineering expertise, the lab provides new routes for materials design for energy applications, corrosions resistant coatings and barrier layers.  

HEIDI: Reaktor for High Power Impulse Magnetron Sputtering Reactor (HiPIMS)

  • High power pulse during on-time (e.g. P = 107 W/m2, 500 μs)
  • Polarized sample holder (up to 30 kV) for coupling HiPIMS with Plasma-immersion ion implantion (PIII)
  • Multitarget-MS processes for compositional mapping

M900P: Reactor for Plasma Ion Assisted Deposition (PIAD)

  • Electron beam evaporation of up to two precursor sources
  • Multi sample holder for up to 50 Si Wafers
  • Homogenously directed plasma by ring shaped magnetic coils

STARON: Reactor for co-sputtering processes

  • 2x RF and 2x DC plasma sources for multi target magnetron sputtering processes
  • Closed Field Unbalanced Magnetron Sputtering (CFUBMS) configuration
  • Tubular (15 cm x 1 cm) and planar substrates (10 x 10 cm2) sample geometry

Rotating drum reactor

  • RF plasma source for PECVD of powder substrates
  • Surface activation and functionalisation of powder substrates

L2H and Nikolas: PVD/CVD reactors

  • Combined magnetron sputtering and PECVD reactor for deposition of powder substrates and immobilised substrates
  • Rotating sample holder for up to 10 g of powdered samples
  • Loading ports for air sensitive samples

Contact

Dr. Martin Rohloff
Phone: +49(0) 3834 554 3843
martin.rohloffinp-greifswaldde

Uwe Lindemann
Phone: +49(0) 3834 554 3892
uwe.lindemanninp-greifswaldde

The “Life Science Laboratory” emerged motivated by the development of the research field of plasma medicine. Its adequate instrumentation facilitated through the ZIK plasmatis flagship projects allows thorough penetration of research questions. INP comprises laboratories that provide comprehensive equipment for advanced analytical and molecular technologies necessary for complementary life science research, including areas under S2 safety regulations.
The impact of plasma on biological systems manifests on the levels of organisms, tissues (organs), cells, and subcellular molecules. Sample types for analyses include (but are not limited to):

  • patient and proband derived tissue
  • tissue from animal experiments
  • HET-CAM and TUM-CAM models
  • primary cells and cell lines
  • 3D multicellular spheroids
  • proteins, peptides, lipids

These sample entities reflecting a broad spectrum of analytical challenges that are adressed with the following devices:

in vivo imaging:

  • IVIS S5 high-throughput in vivo bioluminescence and fluorescence imager (PerkinElmer)
  • TIVITA wound medical hyperspectral imaging (DiaSpective Vision)

tissue preparation:

  • Automated tissue processor for fixation and paraffin-embedding (LOGOS One, Milestone Medical)
  • Microtome (Leica RM2235)
  • Cryotome (Leica CM1950)

imaging:

  • 8-LED climate-controlled confocal Operetta CLS high-content image analysis system (PerkinElmer)
  • Observer Z.1 for fluorescence microscopy (Zeiss)
  • TC5 Laser confocal microscope with climate chamber (Leica)
  • Stereo-fluorescence-microscope (Leica)

cytometry:

  • 7-Laser 32-parameter MoFlo-AstriosEQ 6-way cell sorter (Beckman-Coulter)
  • 3-laser 6-parameter Amnis ImageStream Mark II with autosampler (Merck)
  • 6-laser 21-parameter CytoFLEX LX analyser with autosampler (Beckman-Coulter)
  • 4-laser 13-parameter CytoFLEX S analyser with autosampler (Beckman-Coulter)
  • 1-laser 4-parameter attune NxT analyser (ThermoFisher)

RNA-analysis:

  • transcriptomic microarray analysis platform workflow (Agilent)
  • SPRINT multi-parallel RNA analyser (NanoString)
  • QuantStudio 1 qPCR (ThermoFisher)

Proteomics / mass spectrometry:

  • QExactive classic, QExactive Plus, Exploris achieve high or very high resolution (up to 480,000 resolving power)
  • Two mass spectrometer with unit/high resolution for small molecule research

In combination with nanoflow and normal flow liquid chromatography, compound identification and quantitation with analytical precision

Contact

Dr. Sander Bekeschus
Tel.: +49 (0)3834 554 3948
sander.bekeschusinp-greifswaldde

Dr. Kristian Wende
Tel.: +49 (0)3834 554 3923
Kristian.wendeinp-greifswaldde

Dr. Sybille Hasse
Tel.: +49 (0)3834 554 3921
Sybille.hasseinp-greifswaldde