The heart of the application-oriented research activities are investigations of process monitoring and process control, particularly for molecular plasma processes. Focus is on temporally and spatially resolved qualitative and quantitative chemical analysis of molecular plasmas. The existing spectrum of measurement devices and methods of laser-based plasma diagnostics, the know-how as well as the operation and analysis of the measurement data are constantly being extended. Plasma diagnostics allows absolute measurement of energies, temperatures, and species density via probe diagnostics, absorption spectroscopy and optical emission spectroscopy, and based on the above, determination of all relevant chemical processes.
Laboratories that are especially equipped for diagnostics of practical, simulated chemical plasma processes with state-of-the-art measurement device equipment are available for the investigations.
The diagnostic methods are also suitable for mobile implementation and can be used for external measurements.
FTIR spectroscopy from VIS to mid-IR
Pulsed dye laser in UV-VIS
- Spectral range 200 – 900 nm
Diode laser, quantum cascade laser, interband cascade laser, lead-salt laser and frequency comb laser system
- Spectral range: 300 nm to 20 µm
- CW and pulsed laser
Grating spectrograph with CCD and iCCD cameras in the spectral range: 200 – 900 nm
Cavity ring-down spectroscopy (CRDS), cavity-enhanced absorption spectroscopy (CEAS), optical feedback CEAS (OF-CEAS)
Langmuir probe for temperal-resolution determination of electron energy distribution function, average energy of electrons, plasma densities, plasma potential and floating potential