Mechanisms of ambient-pressure plasma-enhanced chemical vapor deposition – studies of dielectric barrier discharges with short gasresidence times (FiloSurf)

Analysis of mechanisms of ambient-pressure PECVD (plasma-enhanced chemical vapour deposition) using DBDs with short gas-residence times, particularly single-filament DBDs as well as plasma-sheet DBDs, in mixtures of argon with addition of small amounts of different molecular gases including HMDS and TMS as well as hydrocarbons (HCs), such as CH4, C2H2, C2H4 and C2H6. The main topics of the project include: role of ions in DBD-based PECVD from Ar-monomer mixtures; study of thin films grown by DBD-PECVD, i.e. composition, structure, properties; development of complex plasma-chemical models for DBDs in Ar with admixture of HCs or Si-containing precursors; development and execution of 1d-t or 2d-t simulations.

Funded by the German Research Foundation (Deutsche Forschungsgemeinschaft, DFG), project number 504701852, https://gepris.dfg.de/gepris/projekt/504701852.

Partners: Institute for Surface Technology, Technische Universität Braunschweig