Green Ammonia Materials Synthesis Lab

The application lab “Green Ammonia Materials Synthesis Lab” bundles the INP’s long term leading expertise in thin film and nanomaterials synthesis by vacuum-based plasma methods. Reactors are available for multi-target co-deposition and high power impulse magnetron sputtering as well as plasma ion-assisted electron beam evaporation, complemented by surface activation and chemical vapor deposition. In combination with in house engineering expertise, the lab provides new routes for materials design for energy applications, corrosions resistant coatings and barrier layers.  

HEIDI: Reaktor for High Power Impulse Magnetron Sputtering Reactor (HiPIMS)

• High power pulse during on-time (e.g. P = 107 W/m2, 500 μs)
• Polarized sample holder (up to 30 kV) for coupling HiPIMS with Plasma-immersion ion implantion (PIII)
• Multitarget-MS processes for compositional mapping

M900P: Reactor for Plasma Ion Assisted Deposition (PIAD)

• Electron beam evaporation of up to two precursor sources
• Multi sample holder for up to 50 Si Wafers
• Homogenously directed plasma by ring shaped magnetic coils

STARON: Reactor for co-sputtering processes

• 2x RF and 2x DC plasma sources for multi target magnetron sputtering processes
• Closed Field Unbalanced Magnetron Sputtering (CFUBMS) configuration
• Tubular (15 cm x 1 cm) and planar substrates (10 x 10 cm2) sample geometry

Rotating drum reactor

• RF plasma source for PECVD of powder substrates
• Surface activation and functionalisation of powder substrates

L2H and Nikolas: PVD/CVD reactors

• Combined magnetron sputtering and PECVD reactor for deposition of powder substrates and immobilised substrates
• Rotating sample holder for up to 10 g of powdered samples
• Loading ports for air sensitive samples